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So you have developed a technology that holds great promise, but is your company ready? Scaling up to achieve a commercially resilient business calls for more than just excellence in engineering: it calls for readiness on levels that most founders were never trained to assess. To address the gap, deep tech experts and academics from Rotterdam School of Management, Erasmus University (RSM) will present a masterclass, From lab to fab: What's really blocking deep tech companies from scaling on Friday 30 October for leaders of scale-ups in semiconductors and deep tech at the High Tech Campus in Eindhoven.

Eindhoven’s Brainport is a busy open innovation ecosystem resulting from close collaborations between multinational corporations, start-ups, knowledge institutes, and the government – making it one of the top innovation regions in Europe. The masterclass on 30 October will help participants pinpoint exactly where their own scaling challenge sits and opens a structured conversation about what to do next. It will describe the four readiness levels that determine whether a technology can scale into a resilient business, from the foundations that the company can control, directly to the forces that it can only navigate. These levels explain why many technically strong ventures stall – in what founders call ‘the valley of death’, the gap between developing a technology and scaling it commercially.

The RSM experts will unpack each level in detail, with examples that can be applied to scaling journeys right away.

The RSM faculty members and deep tech experts heading the masterclass are: 

Identifying bottlenecks

Participants will assess their own commercial ventures to identify bottlenecks or hindrances, which will be covered in an interactive panel discussion to address organisation, technology, business and future readiness.

The masterclass will also include real examples of success and failure from the deep tech and semiconductor sector, and time to network with fellow scale-up leaders navigating similar deep tech and semiconductor challenges.

Making it work

Where technical hubs and ecosystems focus on building technology, RSM focuses on the issue of making it work in the real world and how people can use it to create wider value. 

Prof. Benischke said: “Building great technology is one thing, but turning that into a successful, growing organisation is a different challenge altogether. As a school with strong roots in business and social sciences, we at RSM believe we can add a perspective that compliments the technological strength that’s already here. It’s about translating technological breakthroughs into successful businesses.

“The challenges faced here are not only technological,” he said. “They are about scaling organisations, leading diverse teams, making decisions in uncertain situations, and doing all of that in a responsible and sustainable way. This is exactly where we add value – by developing leaders who can navigate complexity, drive growth, and strengthen organisations where it matters most”. 

Book your seat

The event is free, but seats are limited. To book a place, please register using the Eventbrite link here. 

More information

Rotterdam School of Management, Erasmus University (RSM) is one of Europe’s top-ranked business schools. RSM provides ground-breaking research and education furthering excellence in all aspects of management and is based in the international port city of Rotterdam – a vital nexus of business, logistics and trade. RSM’s primary focus is on developing business leaders with international careers who can become a force for positive change by carrying their innovative mindset into a sustainable future. Our first-class range of bachelor, master, MBA, PhD and executive programmes encourage them to become critical, creative, caring and collaborative thinkers and doers. www.rsm.nl 

For more information about RSM or this release, please contact Pavlina Novakova, RSM corporate communications and PR manager, or Danielle Baan, science communications lead and PR, by email at press@rsm.nl.

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